MicroSensors and MicroActuators Georgia Tech MEMS group
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Fabrication of Morphology in nanoscale by Polymer Nanolithography Jennifer Liu, David Bucknall, Mark G. Allen Build up nanoscale morphologies or patterns on wafers with a low cost & high through put using nanolithography methods, such as Electron beam lithography (EBL), Nanoimprint Lithography (NIL), as well as combining with polymer thin film’s physical properties. The nanoscale patterned wafer would have a broadly potential application in the BioMEMs area. 3-D AFM image of PDMS pillars with 1 μm in diameter, 1μm in height, and 2 μm in pitch
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